IMS- Micro/Nano Fabrication Facility
Processing (Older)
Remover

Removers Provided

Microposit 1165a remover

 Microposit 1165a Remover 
          Mixture of pure organic solvents formulated to remove all Shipley Microposit and Megaposit photoresists. 


 Chemical Properties
 
  • Recommended for use in applications where photoresist has been seen with high temperatures, strong etchants or other harsh processing conditions
  • Metal ion free
  • neutral pH


Other Removers

AZ 300T

 AZ 300T Remover
          Removes photoresist and residual materials left over after metal plating or etch processes


 Chemical Properties
 
  • Prevents damage to underlying substrate layer
  • Leaves a clean surface free of trace organic residues
  • More aggressive on post metal etch sidewall polymers


AZ Remover 100

 AZ Remover 100
          High performance stripper for cleaner substrate surfaces and exceptional removal of novolac resins and other organic compounds


 Chemical Properties
 
  • Neutral pH
  • Will not damage metal substrates
  • Water-rinsable and biodegradable
  • Low attack on aluminum