IMS- Micro/Nano Fabrication Facility
Processing (Older)
Oxford PECVD Right - Standard Nitride Recipe
 Equipment
          EquipmentOxford PECVD Right

Manufacturer:Oxford Instruments

ModelPlasmalab 80 Plus

Platen Size6 in



 Recipe

Recipe Name:Standard SiN

Gas  Silane: 12 sccm

Ammonia: 10 sccm

Nitrogen: 441 sccm

Helium: 49 sccm

Pressure1000 mtorr

Temperature300°C

Power20 W



 Resultsa

Deposition Rate:170.91 Å/minb

Uniformity:0.72%c

Refractive Index at 633nm:2.085d

Stress Level:310.47 MPascale




a: All data is updated as the date indicated above

b: An average value from 20 min deposition

c: Film thickness variation across a 4” wafer, defined as (max-min)/average

d: An average value across a 4” wafer

e: Measured with optical stress measurement tool