IMS- Micro/Nano Fabrication Facility
Processing (Older)
Metal Etchants

Etchants Provided

Aluminum Etchant Type A

Source: http://seeen.spidergraphics.com/cnf5/doc/Etchant%20Datasheets.pdf


Chromium etchant type 1020

Etchants for chromium thin films for microelectronics applications offer excellent compatibility with positive and negative photoresists. Chromium Etchants provide fine-line control with minimal undercutting. High purity formulations filtered to 0.2 micron are ideal for critical devices.

CHROMIUM ETCHANT 1020
Fast etch rate with minimal undercutting

CHROMIUM ETCHANT 1020AC
Slower etch rate to eliminate undercutting and for broader compatibility

CHROMIUM MASK ETCHANT CE-5M
Ideal for high precision photomask etching.

CHROMIUM CERMET ETCHANT TFE
For chromium-silicon films. Compatible with copper, nickel, and gold.

Source: http://transene.com/cr/


Other Etchants

Nickel Etchant TFB

 Nickel Etchant TFB

Etchant for evaporated or electroplated nickel films


 Chemical Properties
 
  • Clear, non-flammable
  • Compatible with positive and negative photoresists
  • Completely miscible in water
 



Nickel Etchant TFG

 Nickel Etchant TFG

 High purity etchant for electrodeposited nickel films


 Chemical Properties
 
  • Clear, non-flammable
  • Compatible with copper, gallium arsenide and other III-V materials
  • Compatible with positive and negative photoresists
 


Titanium Etchant TFT

 Titanium Etchant TFT

 Designed for etching evaporated films commonly employed as bonding and barrier layers
 Chemical Properties
 
  • Excellent resolution and photoresist compatibility
  • Clear, aqueous solution
  • Non-flammable
  • Compatible with both positive and negative photoresists



Titanium Etchant TFTN

 Titanium Etchant TFTN

Designed for etching Ti films on deposited glass or SiO2 substrates
 Chemical Properties
 
  • Does not contain HF
  • Clear, aqueous solution
  • Non-flammable
  • Compatible with both positive and negative photoresists
  • Metallization - most metals except Al