Etchants Provided
Aluminum Etchant Type A
Source: http://seeen.spidergraphics.com/cnf5/doc/Etchant%20Datasheets.pdf
Chromium etchant type 1020
Etchants for chromium thin films for microelectronics applications offer excellent compatibility with positive and negative photoresists. Chromium Etchants provide fine-line control with minimal undercutting. High purity formulations filtered to 0.2 micron are ideal for critical devices.
CHROMIUM ETCHANT 1020
Fast etch rate with minimal undercutting
CHROMIUM ETCHANT 1020AC
Slower etch rate to eliminate undercutting and for broader compatibility
CHROMIUM MASK ETCHANT CE-5M
Ideal for high precision photomask etching.
CHROMIUM CERMET ETCHANT TFE
For chromium-silicon films. Compatible with copper, nickel, and gold.
Source: http://transene.com/cr/
Other Etchants
Nickel Etchant TFB
| | Nickel Etchant TFB |
| Etchant for evaporated or electroplated nickel films |
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| | Chemical Properties |
| | - Clear, non-flammable
- Compatible with positive and negative photoresists
- Completely miscible in water
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Nickel Etchant TFG
| | Nickel Etchant TFG |
| High purity etchant for electrodeposited nickel films |
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| | Chemical Properties |
| | - Clear, non-flammable
- Compatible with copper, gallium arsenide and other III-V materials
- Compatible with positive and negative photoresists
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Titanium Etchant TFT
| | Titanium Etchant TFT |
| Designed for etching evaporated films commonly employed as bonding and barrier layers | | Chemical Properties |
| | - Excellent resolution and photoresist compatibility
- Clear, aqueous solution
- Non-flammable
- Compatible with both positive and negative photoresists
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Titanium Etchant TFTN
| | Titanium Etchant TFTN |
| Designed for etching Ti films on deposited glass or SiO2 substrates | | Chemical Properties |
| | - Does not contain HF
- Clear, aqueous solution
- Non-flammable
- Compatible with both positive and negative photoresists
- Metallization - most metals except Al
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