Purpose: to remove exposed positive resist and unexposed negative resist

Location: general purpose fumehoods

Chemicals: developer

Supplies Needed: glass or Pyrex dish, PPE, timer, tweezers, bottle carrier, developer, texwipes, fumehood, chemical warning labels

Setup Procedures:

1. Look up the development time and developer type on the photoresist data sheet

2. Fill out a chemical warning label with the name of the developer being used

3. Find a plastic or glass container that will fit your sample

4. Using a bottle carrier, bring a bottle of developer to the fumehood you will be working at

5. Pour enough developer into the container to cover your sample

Number of Substrates: 1

Process Procedures:

1. Set a timer for development

2. Place your sample in the container and start the timer

3. Slightly agitate the container while developing

4. Stop developing once your timer has ended or when you no longer see photoresist coming off the sample

a. If you are unsure if your sample is finished developing, check it under a microscope with a UV filter

b. Under-developed features will have wide corners and thin spaces or a “rainbow” pattern where the resist is still in the feature

c. Over-developed features will have a rounded corners and thin lines

d. If you need to develop for more than the time on the data sheet states, add extra time in small increments, continuously checking under the microscope

5. Take your sample out of the developer and rinse under gently running DI water

6. Place your sample on a texwipe and blow dry with the nitrogen gun. Use a sweeping motion while working from one side of the sample to the opposite side.

7. Dispose of base developer in the sink with plenty of running city water. Solvent developers should be disposed of in the solvent waste jug.

8. Rinse the development container with DI water.

Comments:

a. Under –exposed is better than over-exposed

b. Be sure to note any differences in development times for later use