IMS- Micro/Nano Fabrication Facility
Processing (Older)
Oxford PECVD Left - Amorphous Silicon
 Equipment
          EquipmentOxford PECVD Left

Manufacturer:Oxford Instruments

ModelPlasmalab 80 Plus

Platen Size8 in



 Recipe

Recipe Name:Standard a-Si

Gas  Silane: 25 sccm

Helium: 475 sccm

Pressure1000 mtorr

Temperature250°C

Platen Power35 W



 Resultsa

Deposition Rate: 

Uniformity: 

Refractive Index at 633nm: 

Stress Level: 




a: All data is updated as the date indicated above

b: An average value from 20 min deposition

c: Film thickness variation across a 4” wafer, defined as (max-min)/average

d: An average value across a 4” wafer

e: Measured with optical stress measurement tool