IMS- Micro/Nano Fabrication Facility
Processing (Older)
2. Fabrication Fundamentals
Resist Coater
Atomic Layer Deposition
PhotoResist
Chemical Vapor Depostion
Mask Aligner
Etching Basics

Mask Aligner
Photolithography Basics
Mask Aligner
Phyical Vapor Deposition

 

Contact Information
Hang Chen, Ph.D.
Process Support Manager
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332 | 1152
404.894.3360 | hang.chen@ien.gatech.edu