Login
Select Login Portal
IMS- Micro/Nano Fabrication Facility
Become a User
Services
Capabilities
Safety
Processing
Rates
Contact
SUMS Home
Search
Login
Select Login Portal
Processing (Older)
1. Recipe Library
2. Fabrication Fundamentals
3. Equipment Selection
3. IEN Process Search
3. Standard Operation Procedure
About Staff
Al Etching
Annealing
Au Etching
BLE Spinner
Cambridge NanoTech ALD (left)
Cambridge NanoTech Plasma ALD - Right (non-metal)
Characterization based on Industry Standards
Chemical Dry Etch
Chemical Vapor Deposition (CVD)
Chemicals Inventory
Cr Etching
Cu Etching
Denton Infinity
Developers Provided
Development
Dicing
Direct Write
Dry Etching
Electroless Plating
Electroplating
Flipchip Bonding
General Safety
Georgia Valve and Fitting
Incident Report
Instructional Lab Tools
K&S 4522 - Au Ball Bonding
K&S 4523A - Al Wedge Bonding
Karl Suss RC8 Spinner - Marcus
Karl Suss RC8 Spinner - Pettit
Laser MicroMachining Technologies
Laurel Spinner
LPCVD
Materials
Materials
Metal Deposition
Metal Etchants
New Laser Proposal
Other Developers
Oxford ICP PECVD - Oxide
Oxford PECVD
Oxford PECVD Left - Amorphous Silicon
Oxford PECVD Left - Carbide
Oxford PECVD Right - Oxide
Oxford PECVD Right - Standard Nitride Recipe
P / N Doping
Parker
Parylene
Plasma Etching
Plasma Therm PECVD - Standard Nitride Recipe
Plasma Therm PECVD - Standard Oxide Recipe
Plasma Therm SLR RIE
Polisher / Lapper
Polisher/Lapper
Polymer
Polymer Curing/Sintering
Polysilicon
Process Flow
Process Flow
Processing Help
PVD75 Filament Evaporator
Radiation Safety
Rapid Thermal Process
Recipe Library
Remote Processing
Research Capabilities
Resists
SCS Spincoater Processing Tab
SDS Database
Semiconductor
Silicon Dioxide Etching
Silicon Nitride Etching
STS AOE ICP
STS PECVD 2
STS PECVD 2 - Oxide
Suess AltaSpray Coater
Thermo Oxidation
Thin Film Materials
Titanium Etching
Tool Selection
Tutorials
Tystar Poly Furnace 3
Unaxis PECVD
Vision RIE 1
Wet Bench Chemicals
Wet Etching
Wire Bonding
XeF2 Etching
SCS Spincoater Processing Tab
SCS G3 Spinner Table
Spin Coater 1
Marcus
small pieces up to 4"
Spin Coater 2
Pettit
small pieces up to 4"
Spin Coater 3
Marcus
small pieces up to 4"
General Spin Curves for SCS G3
Spinning Recipes for Provided Resists
SC1827
SC1813
SPR220-7.0
HMDS
NR71-3000P
NR9-1500PY
Speed (RPM)
3000
3000
500/2500
3000
2000
1000
Acceleration (RPM/s)
1000
1000
1000/3000
1000
1000
500
Time (s)
30
30
10/40
30
40
40
Bake Temperature (C)
115
115
110
Optional
150/100(oven)
150/100 (oven)
Bake Time (min)
5
5
3
Optional
20/20
20/20
Approximate Thickness (Microns)
2.9
1.6
7.5
N/A
4.1
2.5
Exposure Wavelengths for Provided Resists
SC1827
SC1813
SPR220-7.0
NR71-3000P
NR9-1500PY
Wavelength (nm)
405
405
365
365
365
Developer and Development Time for Provided Resists
SC1827
SC1813
SPR220-7.0
NR71-3000P
NR9-1500PY
Developer
MF-319
MF-319
MF-319
RD-6
RD-6
Time
1 min
1 min
2-3 min
70 sec
20 sec
Related Links
Lithography Processing Page (under construction)
SCS G3 website
Related Media
Futurrex NR71-3000P Technical Datasheet
Futurrex NR9-1500PY Technical Datasheet
Microposit S1800 Technical Datasheet (S1813/1827)
Contact Information
Hang Chen, Ph.D.
Process Support Manager
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332 | 1152
404.894.3360 | hang.chen@ien.gatech.edu
Loading