IMS- Micro/Nano Fabrication Facility
Processing (Older)
Karl Suss RC8 Spinner - Pettit

Location: Pettit Cleanroom

Substrate Size: < 6 in

Number of Substrates Allowed: one 4" wafer

Special Features:

100 - 5000 RPM  

  

Contact Information
Hang Chen, Ph.D.
Process Support Manager
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332 | 1152
404.894.3360 | hang.chen@ien.gatech.edu