IMS- Micro/Nano Fabrication Facility
Processing (Older)
Materials

 

Thin Film Materials (Wet Etch| Dry Etch | Deposition)

Dielectrics (Deposition|Dry etch|Wet etch)

Metals

 (Deposition|Dry etch|Wet etch)

Polymers 

(Deposition|Dry etch|Wet etch)

  2D materials Semiconductors
Commonly Used Wet Bench Chemicals
Acids Bases Developers
Solvent Photoresist  
     
Precursors
TMA    
     
Processing Gases
SF6 C4F8 CHF3
Cl2 BCl3 HBr
CO2 CH4 SiH4
GeH4 PH3 B2H6

 

 

Semiconductors
Contact Information
Hang Chen, Ph.D.
Process Support Manager
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332 | 1152
404.894.3360 | hang.chen@ien.gatech.edu