IMS- Micro/Nano Fabrication Facility
Processing (Older)
Photolithography


Spray Coating

Standard Recipe for AZ4620 10um

Mixture Ratio

(Resist:Acetone:MEK)

1:9:1
Chuck Temperature60 C
Pump Rate4.0 uL/min
N2 Pressure1.5 bar
Y Speed180 mm/sec
Passes4


Standard Recipe for NR71-3000p 7um

Mixture Ratio

(Resist:Acetone:MEK)

1:5:1
Chuck Temperature60 C
Pump Rate1.5 uL/min
N2 Pressure1.5 bar
Y Speed250 mm/sec
Passes4


Standard Recipe for NR21-20000p 7um

Mixture Ratio

(Resist:Acetone:MEK)

1:15:1
Chuck Temperature60 C
Pump Rate1.5 uL/min
N2 Pressure1.5 bar
Y Speed250 mm/sec
Passes12


Standard Recipe for SC1827 5um

Mixture Ratio

(Resist:Acetone:MEK)

1:4:1
Chuck Temperature60 C
Pump Rate2.8 uL/min
N2 Pressure1.5 bar
Y Speed250 mm/sec
Passes4


Spin Curves

Standard Spin Curves

BLE Spinner

Karl Suss RC8 - Marcus Spin Curves



Lithography Guide

General Dose Guide

The dosage required will often vary on a case-by-case basis. It depends on the type of resist, the thickness of the resist, and the intensity of the radiation (which itself varies on the exposure tool). Exposure tools at the IEN have intensity probes that are used to determine the intensity of the radiation. Sometimes, a log is present at the tool for users to record the measured intensity at a particular time. This can remove the need to measure the intensity everytime the tool is used.


The exposure time can be calculated by taking the dosage (found on the photoresist datasheet) and dividing it by the intensity measured. If possible, the intensity can be measure through the mask. If there is not a large enough clearfield space to accommodate the sensor, subtract 1.0 mW/cmto account for the intensity lost traveling through the mask. The intensity loss can vary depending on the mask material, so that value should be looked up before exposure if unable to measure through the mask.

General Resist Guide

Spinning Recipes for Provided Resists



SC1827SC1813SPR220-7.0HMDSNR71-3000PNR9-1500PY
Speed (RPM)30003000500/2500300020001000
Acceleration (RPM/s)100010001000/300010001000500
Time (s)303010/40304040
Bake Temperature (C)115115110Optional150/100(oven)150/100 (oven)
Bake Time (min)553Optional20/2020/20
Approximate Thickness (Microns)2.91.67.5N/A4.12.5



Exposure Wavelengths for Provided Resists



SC1827SC1813SPR220-7.0NR71-3000PNR9-1500PY
Wavelength (nm)405405365365365


Developer and Development Time for Provided Resists



SC1827SC1813SPR220-7.0NR71-3000PNR9-1500PY
DeveloperMF-319MF-319MF-319RD-6RD-6
Time1 min1 min2-3 min70 sec20 sec