IMS- Micro/Nano Fabrication Facility
Processing
Titanium Etchant TFTN
 Titanium Etchant TFTN

Designed for etching Ti films on deposited glass or SiO2 substrates
 Chemical Properties
 
  • Does not contain HF
  • Clear, aqueous solution
  • Non-flammable
  • Compatible with both positive and negative photoresists
  • Metallization - most metals except Al