IMS- Micro/Nano Fabrication Facility
Processing
Electroless Nickel
 Equipment
           EquipmentPlating Station

Substrate Sizeup to 6" wafer



 Plating Parametersa

Plating Solution Transene Nickelex

pH 5

Temperature 90 - 98 oC

Substrate Si, Ge, GaAs, Ni, CdS, Kovar

Deposition Rate 200 nm/min at 95 oC on silicon







a: The parameters are provide by Transene