IEN - Micro/Nano Fabrication Facility
MRL Furnace - Tube 3
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Equipment Description

The Georgia Tech MRL Furnace 2 is used for dry oxidation at temperatures between 700 -1150°C. Batches of up to 50 wafers (4 to 6”) can be processed with excellent uniformity (less than 1%).

Institute Georgia Tech
Department IEN - Micro/Nano Fabrication Facility
Sub Tool Of
Marcus Inorganic Cleanroom
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