IEN - Micro/Nano Fabrication Facility

Elionix

G Series
ELS-G100

The Elionix ELS-F100 is a high speed, ultra high precision thermal field emission (TFE) electron beam lithography system developed to meet the market needs for next-generation nanometric applicatioread more


 
Model:
ELS-G100
Nano Specs:
  • Generates patterns with a line width of 7nm
  • Stable 1.8nm electron beam using high beam current at 100kV
  • A 20bit DAC provides high beam positioning resolution
  • At a beam current of 1nA, 20nm lines can be written over an entire 500μm field without stitching
  • 8 inch stage
Related Links
Contact Information
Devin K. Brown
Senior Research Engineer
Phone: (404) 385-4220
Email: devin.brown(at)ien.gatech.edu