IEN - Micro/Nano Fabrication Facility
Thin Films

Major pieces of equipment in the Georgia Tech IEN cleanroom include: mask fabrication, spin coaters, spray coater, direct writing, contact mask aligners, E-beam lithography, nano imprinter, nano eNabler, ink jet dispenser, material growth tools, LPCVD, PECVD, ICP, ALD, wet etching stations, reactive ion etching, inductively coupled plasma, e-beam evaporation, filament evaporation, RF/DC sputtering, dicing saws, probe stations, Lapping,Polishing,  ovens, contact and optical profilometers, ellipsometers, refractometers, optical microscopes, SEM, EDXFor more information, visit the IEN cleanroom webpage.

 

Atomic Layer Deposition

 

E-beam

 

PECVD

 

Sputterer

 

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