Etching is used in Micro-fabrication to chemically remove layers from the surface of a wafer during manufacturing. The cleanrooms at IEN carry a multitude of tools which can be used for a wide variety of etching processes including oxides, substrates, and metal etching.
The capabilities of the Etching tools are divided into four categories: HF Vapor Etching, ICP Etching Equipment, Plasma Cleaning, RIE Equipment.
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HF Vapor Etching
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ICP Equipment
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Plasma Cleaning
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RIE Equipment
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