IEN - Micro/Nano Fabrication Facility

Etching is used in Micro-fabrication to chemically remove layers from the surface of a wafer during manufacturing. The cleanrooms at IEN carry a multitude of tools which can be used for a wide variety of etching processes including oxides, substrates, and metal etching. 

The capabilities of the Etching tools are divided into four categories: HF Vapor Etching, ICP Etching Equipment, Plasma Cleaning, RIE Equipment.


HF Vapor Etching


ICP Equipment


Plasma Cleaning


RIE Equipment




Contact Information
Tran-Vinh Nguyen
Process Equipment Engineer III

Institute for Electronics and Nanotechnology (IEN)
Georgia Institute of Technology