IMS- Micro/Nano Fabrication Facility
Plasma Therm ICP (Single Chamber)
Information
Schedule
Training
Equipment Description

The Georgia Tech ICP (inductively coupled plasma) etcher (DRIE) can be used to etch a variety of materials. This ICP is equipped with single chamber for shallow Si and dielectric etching. Wafer sizes 4" and small samples are allowed in the chamber.

Institute Georgia Tech
Department IMS- Micro/Nano Fabrication Facility
Sub Tool Of
 Marcus Inorganic Cleanroom
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Contact Information
Georgia Institute of Technology
Shared User Management System
791 Atlantic Drive
Atlanta GA 30332-0269 
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