IEN - Micro/Nano Fabrication Facility
Plasma Therm ICP (Single Chamber)
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Equipment Description

The Georgia Tech ICP (inductively coupled plasma) etcher (DRIE) can be used to etch a variety of materials. This ICP is equipped with single chamber for shallow Si and dielectric etching. Wafer sizes 4" and small samples are allowed in the chamber.

Institute Georgia Tech
Department IEN - Micro/Nano Fabrication Facility
Sub Tool Of
Marcus Inorganic Cleanroom
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