IEN - Micro/Nano Fabrication Facility
Georgia Tech Plasma Clean Landing Page

Georgia Tech plasma cleaning is the removal of impurities and contaminants from surfaces through the use of an energetic plasma or dielectric barrier discharge plasma created from gaseous species. Gases such as argon and oxygen, as well as mixtures such as air and hydrogen/nitrogen are used.


Gasonics Asher (Inorganic)

Microwave O2 plasma clean

YES-R1 Plasma Cleaner

RF O2 plasma clean


Contact Information
Institute for Electronics and Nanotechnology (IEN)
Georgia Institute of Technology

For process support please click below