IEN - Micro/Nano Fabrication Facility
Georgia Tech ICP Landing Page

Georgia Tech ICP (Induced Coupled Plasma) Etching is a frequently used etch technology in semiconductor fabrication. ​​ ICP systems generate a high density plasma which allow for high etch rates as well as high etch uniformity.

Commonly used for etching Gallium Nitride, Silicon structures, as well as Tungsten.

 

Plasma Therm ICP

F-, Cl- chemistry based non-Bosch process

STS HRM ICP

Bosch process for Si etch only

STS Pegasus ICP

Bosch process for Si etch only

STS AOE ICP Pro

F- chemistry based non-Bosch process

 

Contact Information
Tran-Vinh Nguyen
Process Equipment Engineer III

Institute for Electronics and Nanotechnology (IEN)
Georgia Institute of Technology
tran-vinh.nguyen@ien.gatech.edu
404-385-6678(Office)