The Georgia Tech e-beam evaporator is used to coat samples with various metals. Unlike sputtered films, evaporators only coat the surface facing away from the substrate. -Typical deposition rates range from <1 A/sec to 3 A/sec.

Function

• E-beam Evaporation System

Materials Deposited

• Ti, Cr, Ni, Au, Al, Cu, Ag, W, Mo

Component Specifications

• One sample holder for up to a 6”wafer.
• Six 15cc pocket crucible selector

Substrate Size

• Up one 6” wafer

Process Pressure

• 5x10-6Torr to 5x10-7Torr

Vendor Specified Capabilities

• Crystal Sensor monitored deposition controller
• Automatic Shutter Control