The CVC DC sputterer is used to coat samples with metals. Specifications: -wafers/substrates up to 6" -new touchscreen control system -two 3" and two 8" sputter guns -rotostrate for improved uniformity -base pressure 5e-6 Torr

Function

• DC Sputterering System

Materials Deposited

• Ti, Cu, Al, Cr, W, Mo, Ta, Ag

Component Specifications

• Two 3” sputtering guns
• One 6” sputtering gun.
• Six 6” sample holder rotostrate

Gases

• Ar

Substrate Size

• Up to 6” wafers

Process Pressure

• 5mTorr

Vendor Specified Capabilities

• Sputtering gun shutter system
• DC Sputtering system
• Can run batch recipes.