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Processing
1. New User Preparation
2. Processing Basics
2.1 Photolithography
2.2 Thin Film Deposition
2.2.1 CVD
2.2.2 PVD
2.2.3 ALD
2.3 Plasma Etching
2.4 Thermal Processing
2.5 Metrology
2.6 Packaging
2.7 Technical Seminars
3. Recipe Library
4. Processing Procedure
5. Process/Equipment Selection
6. Processing Materials
7. Equipment Baseline
8. Processing Safety
9. Request Help
A. System Contamination Control Policy
2.2.2 PVD
Physical Vapor Deposition (PVD) Equipment Overview
Physical Vapor Deposition (PVD) Fundamentals
Related Links
AJA Nitride Sputterer
CHA E-beam Evaporator 1
CHA E-beam Evaporator 2
Denton Discovery - RF/DC Sputterer
Denton Explorer - E-beam Evaporator
PVD75 Filament Evaporator
PVD75 RF Sputterer 1
Unifilm Sputterer
Contact Information
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332
For process support please click below
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