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IMS- Micro/Nano Fabrication Facility
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Processing
1. New User Preparation
2. Processing Basics
2.1 Photolithography
2.2 Thin Film Deposition
2.3 Plasma Etching
2.4 Thermal Processing
2.5 Metrology
2.6 Packaging
2.7 Technical Seminars
3. Recipe Library
4. Processing Procedure
5. Process/Equipment Selection
6. Processing Materials
7. Equipment Baseline
8. Processing Safety
9. Request Help
A. System Contamination Control Policy
2.1 Photolithography
Photolithography Equipment Overview
Photolithography Fundamentals
Related Links
Heidelberg MLA150 no.1
Heidelberg MLA150 no.2
Karl Suss MA-6 Mask Aligner
Karl Suss TSA MA-6 Mask Aligner
Contact Information
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332
For process support please click below
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