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IMS- Micro/Nano Fabrication Facility
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Processing
1. New User Preparation
2. Processing Basics
2.1 Photolithography
2.2 Thin Film Deposition
2.3 Plasma Etching
2.4 Thermal Processing
2.5 Metrology
2.6 Packaging
2.7 Technical Seminars
3. Recipe Library
4. Processing Procedure
5. Process/Equipment Selection
6. Processing Materials
7. Equipment Baseline
8. Processing Safety
9. Request Help
A. System Contamination Control Policy
2.3 Plasma Etching
Etching Equipment Overview
Plasma Etching Fundamentals
Related Links
Oxford End-point RIE
Plasma Therm 790 RIE
Plasma Therm ICP
Plasma Therm RIE
Plasma Therm SLR RIE
STS ICP
STS Pegasus ICP
STS SOE ICP
Unaxis RIE
Vision RIE 1
Vision RIE 2
Contact Information
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332
For process support please click below
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