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Processing
1. New User Preparation
2. Processing Basics
2.1 Photolithography
2.2 Thin Film Deposition
2.2.1 CVD
2.2.2 PVD
2.2.3 ALD
2.3 Plasma Etching
2.4 Thermal Processing
2.5 Metrology
2.6 Packaging
2.7 Technical Seminars
3. Recipe Library
4. Processing Procedure
5. Process/Equipment Selection
6. Processing Materials
7. Equipment Baseline
8. Processing Safety
9. Request Help
A. System Contamination Control Policy
2.2.1 CVD
Chemical Vapor Deposition (CVD) Equipment Overview
Chemical Vapor Deposition (CVD) Fundamentals
Related Links
Aixtron Black Magic PECVD
Oxford ICP-PECVD
STS PECVD 3
Unaxis PECVD
Contact Information
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332
For process support please click below
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