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Processing
1. New User Preparation
2. Processing Basics
2.1 Photolithography
2.2 Thin Film Deposition
2.2.1 CVD
2.2.2 PVD
2.2.3 ALD
2.3 Plasma Etching
2.4 Thermal Processing
2.5 Metrology
2.6 Packaging
2.7 Technical Seminars
3. Recipe Library
4. Processing Procedure
5. Process/Equipment Selection
6. Processing Materials
7. Equipment Baseline
8. Processing Safety
9. Request Help
A. System Contamination Control Policy
2.2.3 ALD
Atomic Layer Deposition (ALD) Equipment Overview
Atomic Layer Deposition (ALD) Fundamentals
Related Links
Cambridge NanoTech Plasma ALD - Metal
Cambridge NanoTech Plasma ALD - Oxide
CtrLayer ALD 1
CtrLayer ALD 2
Veeco ALD
Contact Information
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332
For process support please click below
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