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IMS- Micro/Nano Fabrication Facility
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Processing
1. New User Preparation
2. Processing Basics
2.1 Photolithography
2.2 Thin Film Deposition
2.3 Plasma Etching
2.4 Thermal Processing
2.5 Metrology
2.6 Packaging
2.7 Technical Seminars
3. Recipe Library
4. Processing Procedure
5. Process/Equipment Selection
6. Processing Materials
7. Equipment Baseline
8. Processing Safety
9. Request Help
A. System Contamination Control Policy
2.5 Metrology
Metrology Equipment Overview
Metrology Fundamentals
Profilometry Fundamentals
Related Links
Bowoptic Stress Measurement
Dektak 150 Profilometer
Hitachi S-3700N VP-SEM
Hitachi S-4700 FE-SEM
Tencor KLA Profilometer
Tencor KLA Profilometer - (FC)
Tencor P15 Profilometer
Woollam M2000 Ellipsometer
Wyko Profilometer NT3300
Contact Information
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332
For process support please click below
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