IEN - Micro/Nano Fabrication Facility
3.5.3 Metal Etching

This section contains the standard Platinum Etch and Chromium Etch recipes for all GT ICP equipment.

Platinum Etch

  • Instrument: Plasma Therm ICP (Left Chamber)
  • Location: Pettit Cleanroom
  • Sample size:
    • Pieces to 4” wafer. Pieces have to be placed on a four inch Si wafer with cool grease, or with a kapton tape.
  • Standard Recipes:

Plasma Therm ICP left Platinum Etch

(Back to Top)

Chromium Etch

  • Instrument: Plasma Therm ICP (Left Chamber)
  • Location: Pettit Cleanroom
  • Sample size:
    • Pieces to 4” wafer. Pieces have to be placed on a four inch Si wafer with cool grease, or with a kapton tape.
  • Standard Recipes:

Plasma Therm ICP left Chromium Etch

(Back to Top)

Contact Information
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332

For process support please click below