This section contains the standard III-V etch recipes for all GT ICP equipment: Plasma Therm ICP (Left Chamber)

Plasma Therm ICP (Left Chamber)

• Location: Pettit Cleanroom
• Etching Capabilities:
  • GaN Etch
• Sample size:
  • Pieces to 4” wafer. Pieces have to be placed on a four inch Si wafer with cool grease, or with a kapton tape.
• Standard Recipes: