This section contains the standard recipes for all GT PECVD equipment: Unaxis PECVD; STS PECVD 3; Oxford ICP-PECVD

Unaxis PECVD

• Location: Pettit Cleanroom
• Materials available:
  • Silicon Dioxide
  • Silicon Nitride
  • Silicon Oxynitride
  • Amophorous Silicon
• Platen size:
  • 11" platen
  • Up to four 4” wafers at one time

Standard Recipes

(back to top)

STS PECVD 3

• Location: Marcus Inorganic Cleanroom
• Materials available:
  • Silicon Dioxide
  • Silicon Nitride
• ​Sample size:
  • pieces to 4” wafer
  • Up to one 4” wafer

Standard Recipes

​

(back to top)

Oxford ICP-PECVD

• Location: Marcus Inorganic Cleanroom
• Materials available:
  • Silicon Dioxide
  • Silicon Nitride
• ​Sample size:
  • pieces to 4” wafer
  • Up to one 4” wafer

Standard Recipes

(back to top)