The Georgia Tech PVD Filament Evaporator in the Pettit Instructional Lab  is used to coat samples with various metals. The PVD is a good choice for samples that need to be evaporator coated (to avoid coating the sides of rough topologies) but are sensitive to x-ray radiation from the E-beam. -Integrated touch screen control -Single substrate up to 12" diameter -Multiple substrate up to 4" diameter -Substrate fixture rotation up to 20 rpm

Function

• Filament Evaporation System

Materials Deposited

• Al, Cu, Cr, Au

Component Specifications

• 12” diameter sample holder.
• Three nodes for three different sources

Substrate Size

• Up to 12” wafer

Process Pressure

• 5x10-6Torr to 5x10-7Torr

Vendor Specified Capabilities

• Crystal monitor deposition controller