The Georgia Tech Unaxis PECVD is a Plasma-Enhanced Chemical Vapor Deposition (PECVD) equipment for deposition of high quality semiconductor and dielectric thin films.

Specification:

1. SiO2, Si3N4, a-Si
2. Huge platen size holding up to 4 4" wafers
3. He gas available for low-stress nitride deposition
4. P+/N- doping gases available
5. High frequency RF power only