The Georgia Tech CVD FirstNano Graphene furnace is currently configured for graphene on Cu foil, graphene sublimation from SiC samples (epitaxial graphene), and H2 etch clean of samples. Samples are heated via 10kW RF induction heating.

Specifications:
-quartz chamber with graphite susceptor
-3in wafer and small pieces
-2200C max
-fully programmable
-turbo pump for low pre-processing base pressure (9.0e-7 Torr)
-Ar, H2, SiH4, CH4

(keywords: silicon carbide growth materials)