IEN - Micro/Nano Fabrication Facility
JetFirst RTP

 

 
Information
Schedule
Training
Equipment Description

The Georgia Tech JetFirst RTP system is a rapid temperature processing system for up to 4" wafers. Specs: -ramp rate up to 70C/s -max allowable temp: 1100C -center thermocouple -outer edge (4" wafer) thermocouple for monitoring only -N2, O2, 10% forming gas (H2/N2) available -vacuum <1Torr

Institute Georgia Tech
Department IEN - Micro/Nano Fabrication Facility
Sub Tool Of
 Marcus Inorganic Cleanroom
Contact Information
Georgia Institute of Technology
Shared User Management System
791 Atlantic Drive
Atlanta GA 30332-0269 
© Georgia Institute of Technology