IEN - Micro/Nano Fabrication Facility
Etching

     

 

Etching is used in Micro-fabrication to chemically remove layers from the surface of a wafer during manufacturing. The cleanrooms at IEN carry a multitude of tools which can be used for a wide variety of etching processes including oxides, substrates, and metal etching. 

The capabilities of the Etching tools are divided into four categories: HF Vapor Etching, ICP Etching Equipment, Plasma Cleaning, RIE Equipment.


        HF Vapor Etching

        ICP Equipment

      Plasma Clean

      RIE Equipment

 

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Contact Information
Tran-Vinh Nguyen
Process Equipment Engineer III

Institute for Electronics and Nanotechnology (IEN)
Georgia Institute of Technology
tran-vinh.nguyen@ien.gatech.edu
404-385-6678(Office)