IEN - Micro/Nano Fabrication Facility

Etching is used in Micro-fabrication to chemically remove layers from the surface of a wafer during manufacturing. The cleanrooms at IEN carry a multitude of tools which can be used for a wide variety of etching processes including oxides, substrates, and metal etching. 

The capabilities of the Etching tools are divided into four categories: HF Vapor Etching, ICP Etching Equipment, Plasma Cleaning, RIE Equipment.


HF Vapor Etching


ICP Equipment


Plasma Cleaning


RIE Equipment




Related Links
No links added...
Related Media
No content to show...
Contact Information
Tran-Vinh Nguyen
Process Equipment Engineer III

Institute for Electronics and Nanotechnology (IEN)
Georgia Institute of Technology