Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. ​​​The cleanrooms at IEN carry a multitude of tools which can be used for a wide variety of etching processes including oxides, substrates, and metal etching. 

The capabilities of the Etching tools are divided into four catagories: HF Vapor Etching, ICP Etching Equipment, Plasma Cleaning, RIE Equipment.


HF Vapor Etching                                                                    ICP Equipment


Plasma Cleaning                                                                      RIE Equipment



Please contact us at 404-385-6678 or if you have any questions.

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Tran-Vinh Nguyen
Process Equipment Engineer III

Institute for Electronics and Nanotechnology (IEN)
Georgia Institute of Technology