IEN - Micro/Nano Fabrication Facility
Heraeus Vacuum Oven 1 (Top)
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Equipment Description

The Georgia Tech Heraeus Vacuum Oven used for heating of substrates under 5-10 milliTorr Vacuum - up to 350C under vacuum. The oven can be programmed to ramp, dwell, and cool down due to the user's specifications. The vacuum pressure for this oven (top oven) under nitrogen atmosphere can be controlled using a throttle-valve and nitrogen MFC.

Institute Georgia Tech
Department IEN - Micro/Nano Fabrication Facility
Sub Tool Of
Marcus Inorganic Cleanroom
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