IMS- Micro/Nano Fabrication Facility
Technics Micro RIE

Keywords: Lithography, UV, etch, oxide, clean, wafer

Information
Schedule
Training
Equipment Description

The Georiga Tech Technics Micro RIE -- Pettit Cleanroom.

Functions

  • Simple descum and surface activation
  • Low entry cost

Materials etched

  • Si, polymer

Gases

  • O2, N2

Substrate

  • small pieces - 100mm wafer
Institute Georgia Tech
Department IMS- Micro/Nano Fabrication Facility
Sub Tool Of
 Pettit Cleanroom
Applications Can be used to Etch:
-Silicon Dioxide
-Silicon Nitride
-Silicon
-Aluminum and Alloys
-Regractory Metal Silicides
-Chrome
-Gallium Arsenide and Alloys
-Indium Tin Oxide
-Polyamides
-Photoresist
Related Links
Contact Information
Georgia Institute of Technology
Shared User Management System
791 Atlantic Drive
Atlanta GA 30332-0269 
© Georgia Institute of Technology