IEN - Micro/Nano Fabrication Facility
SCS G3P8 Spin Coater-Soft Litho

Keywords: Photoresist, spin coater, spinner, lithography, soft, deposit, deposition

Equipment Description

The Georgia Tech SCS G3 Spin Coater series, located in the Georgia Tech Biocleanroom, accurately applies liquid coating materials on planar substrates. This spin coater stores and executes up to 30 programs with up to 20 steps each. Each step of the cycle can be defined in the range of 0-9999RPM with ramp times from 0.1 to 25.5 seconds. Ramp-up time is dependent on the chuck size and the substrate weight. A single step may have a dwell time of up to 999 seconds. Coating cycles are interruptible by the operator at any time. This spin coater has chucks designed for wafers or pieces 1-4 inches.

Institute Georgia Tech
Department IEN - Micro/Nano Fabrication Facility
Sub Tool Of
Georgia Tech Biocleanroom
System Specifications -RPM Range: 0-9,999 RPMs

-Compatible with Silicon, Glass, or Germanium Substrates

-8 inch bowl size
Applications Widely used to make thin films in the micron-nanoscale range. Common in semiconductor and microelectronic industries
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