IEN - Micro/Nano Fabrication Facility
MJB4 Mask Aligner

Keywords: Lithography, UV, photoresist, 365nm, 405nm, channels, exposure

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Equipment Description

The Georgia Tech MJB4, located in the Georgia Tech Biocleanroom, offers only 365nm wavelength light from a mercury lamp for the exposure illumination. The aligner performs exposures in vacuum (vacuum between substrate and mask), low vacuum (vacuum level between substrate and mask can be adjusted), hard (nitrogen pressure under the substrate), soft (vacuum under the substrate) contacts, and flood exposure (require with or without a mask). Line space resolution up to 0.8 micron can be achieved under optimum conditions in the vacuum mode, up to 1 micron for hard contact and up to 2 microns for soft contact. 
The size of substrates are ranging from small samples to 3 or 4 in wafers.

Institute Georgia Tech
Department IEN - Micro/Nano Fabrication Facility
Sub Tool Of
Georgia Tech Biocleanroom
System Specifications -Max Resolution: 0.5 microns

-Capable of Hard Contact, Soft Contact, and Vacuum Contact

-Max Wafer Size: 4inches (100mm)

-Max substrate Size: 100mm x 100mm
Applications -Highly flexible photolithography mask alignment system for R&D and Process applications
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