Heidelberg MLA 150 Maskless Aligner

The Georgia Tech Heidelberg MLA150 has been specifically designed for easy operation and includes all our know-how on developing maskless lithography systems that we have gathered in the past 30 years. It offers all the capabilities that are required for single layer and multi-layer applications and because the MLA150 exposures are always non-contact it will even overcome some of the limitations of photomask based exposure technologies. 

What sets the MLA150 apart from other pattern generators is not only the usability but also the extreme exposure speed. Exposing an area of 100x100mm² with structures as small as 1 micron will take less than 10 minutes – independent of the fill factor or number of structures within this area. Alignment in multi-layer applications is achieved within 2 minutes by using three integrated cameras with varying resolution. Layer to layer alignment accuracy is better than 500nm and does not depend on the operator’s level of training.      

Experience the flexibility that the MLA150 Maskless Aligner will provide and expose your layout directly to accelerate your work in the areas of Life Science, MEMS, Micro-Optics, Semiconductor, Sensors, Actuators, MOEMS, Material Research, Nano-Tubes, Graphene, and any other application that requires microstructures.