The Georgia Tech RC8 programmable process spinner is reserved for photoresist use. Spin coatings of other materials must be done with other spinners. Photoresist coatings are usually performed with the CEE 100CB spin coaters. This spinner is capable of processing up to 6" wafers, has motorized and programmable position dispense arm, maximum speed of 5,000 rpm and an acceleration of 100 to 5000 rpm/s.