IMS- Micro/Nano Fabrication Facility
Suss Alta Spray Coater
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Equipment Description

The Georgia Tech SUSS MicroTec's proprietary AltaSpray coating technology is a unique resist deposition method that is capable of producing highly uniform resist films on different 3-D microstructures. The AltaSpray technology is capable of coating 90° corners, KOH cavities, Through Silicon Vias (TSVs) or lenses with topographies ranging from a few micron to 600µm or more.

Institute Georgia Tech
Department IMS- Micro/Nano Fabrication Facility
Sub Tool Of
Marcus Inorganic Cleanroom
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