IEN - Micro/Nano Fabrication Facility
Hitachi S-3700N Variable Pressure SEM

Keywords: Georgia Tech, gatech, SEM, Variable Pressure, VP-SEM, E-SEM, VPSEM, ESEM, non-conductive, non conductive, organic, cleanroom, EDX, EDS, analysis, materials, characterization, material

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Equipment Description

The Georgia Tech Hitachi S-3700N Variable Pressure SEM, located in the Georgia Tech Biocleanroom, features a low vacuum observation of 6–270 Pa (7mT-2Torr) which enables imaging of non-conductive samples (dielectrics) and wet/moist samples such as cultured cells, without traditional sample preparation (gold coating/drying). A Deben Coolstage controls sample temperature between -10F and 120F to control sample vapor pressure.

-Magnification range: x5 – x300,000
-Resolution @ 30kV (SE in High Vacuum Mode): 3nm
-Resolution @ 30kV (BSE in 6Pa Low Vacuum Mode): 4nm

Institute Georgia Tech
Department IEN - Micro/Nano Fabrication Facility
Sub Tool Of
Georgia Tech Biocleanroom
System Specifications -Resolution in SE imaging (High vacuum mode)
3.0nm @ 30kV
10nm @ 3kV

-Resolution in BSE Imaging (Low vacuum mode) 4.0nm @ 30kV

-Accelerating voltage 0.3-30kV

-Magnification 5x - 300,000x

-Specimen stage (X,Y Axis) 150mm x 110mm

-Maximum specimen size 300mm diameter

-Maximum observation area 203mm dia (with R)

-Maximum specimen height 110mm (WD=10mm)

-Stage control Computer eucentric stage with 5-axes motorization

-Specimen tilt -20/+90 degrees
Applications -Biological (food, plant, emulsions) and other non-conductive sample imaging
-Surface topography analysis
-Polymer nanoparticles imaging
-Photoresist pattern integrity analysis
-Elemental analysis with EDS
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