IMS- Micro/Nano Fabrication Facility
4.1.2 CMOS Clean

Introduction:

Purpose: To remove residual organic, oxide and metal materials

Location: CMOS Station

Chemicals: please see sections for RCA Cleaning

Supplies Needed: Teflon boat, Teflon boat handle, beakers or graduated cylinders, and PPE

Setup Procedures:

  1. Using bottles carriers, bring any chemical bottles that you may need to the cleaning station.
  2. Put on your PPE gear.
  3. To create solutions:
    • Please follow the previous instructions for creating ratios of SC-1 and SC-2 solutions.
    • For the pre-made piranha solution bath, you only need to add 50-100 mL of hydrogen peroxide.
    • For the pre-made BOE bath, you do not need to add anything.
  4. If using a heated bath, turn on the appropriate heater.
  5. Allow the bath to come to temperature (15-20 minutes).
  6. Transfer your wafers to one of the Teflon boats at the station and put a handle on the boat.

Number of Substrates: Multiple full wafers (up to a full cassette)

Process Procedures:

  1. Once the bath is up to the proper temperature (see piranha cleaning and RCA cleaning sections), place the boat into the solution bath.
  2. Turn on the timer.
  3. Once the timer is done (10 minutes), hold the boat of wafers over the solution until it stops dripping.
  4. Place the boat of wafers into one of the rinse baths.
  5. Start the rinse bath.
  6. Once the rinse bath is done (approximately 10 minutes), place a few texwipe on the fumehood counter and set your boat on them.
  7. Remove the handle from the boat.
  8. Place the boat in the spin-rinse dryer and press start.
  9. Once the spin-rinse dryer is done (approximately 5 minutes), remove the blue boat and transfer your samples to your box.

Time:  please see individual processes listed above

Comments:

  1. The CMOS Station has pre-made piranha and BOE baths
  2. There are also tanks for SC-1 and SC-2 solutions that must be mixed before use.
  3. The cleaning station should only be used for cleaning multiple wafers.
  4. There are no polymers allowed at the CMOS cleaning station.

Verification:

  1. Particle level: can be observed under microscope with dark field, or measured accurately with Surfscan
  2. Hydrophobicity: can be measured with contact angle measurement tool
Contact Information
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332

For process support please click below