Purpose: To uniformly spin resist or polymer onto a sample

Location: Pettit or Marcus cleanrooms

Chemicals: photoresist, acetone

Supplies Needed: spinner, spinner chuck, pipettes, aluminum foil, texwipe, bottle carriers, hot plate or oven, tweezers

Setup Procedures:

1. Set the hotplate or oven to the temperature needed for your pre-bake.
2. Make sure that your wafer is clean (see previous section).
3. Line the spinner bowl with aluminum foil, if necessary.
4. Choose the appropriate chuck so that your sample covers the entire chuck.
5. Properly line up the chuck with the shaft of the spinner. Do NOT force a chuck onto the shaft if it is not lined up.
6. Make sure that any screws are tight and not protruding above the chuck
7. Program your parameters according to the recipe on the photoresist data sheet.

     Number of Substrates: 1

     Process Parameters:

1. Place you sample on the spinner chuck
2. Run your recipe without photoresist to test the vacuum of the spinner
3. Dispense your resist in two possible ways:
   • For a thinner resist, pipette from the amber bottle. Do NOT place a pipette in a stock bottle
   • For a thicker resist, pour from the amber bottle directly to your wafer. Do NOT pour directly from a provided stock bottle.
4. When dispensing your photoresist:
   • Make sure the resist is at room temperature
   • Remove any particles or bubbles in the resist
   • Dispense in a continuous stream, close to your wafer
   • Dispense only enough resist to coat your sample
5. Close the lid to the spinner (if it has one)
6. After starting the recipe, close the fumehood door
7. Throw any pipettes used for dispensing resist in the labeled solvent trash cans.
8. Once the recipe is complete, remove your sample and place on the preset hotplate or oven rack.
9. Set a timer for your pre-exposure bake.
10. Clean the spinner and chuck with acetone and texwipe
    • Take the chuck off of the spinner to clean it
    • Throw all used texwipes into the solvent waste container
11. Close the fumehood door when you are done cleaning the spinner
12. Photoresist will be on your gloves, so they need to be changed immediately when you are done cleaning the spinner
13. When your hotplate/ oven timer goes off, set your samples on a texwipe on a counter to cool before returning them to the sample box.

Verification:

• Film Thickness: can be measured accurately with Nanospec Refractometer or the Woollam M2000 Ellipsometer