Purpose: To remove exposed positive resist and unexposed negative resist
Location: General purpose fumehoods
Chemicals: developer
Supplies Needed: glass or Pyrex dish, PPE, timer, tweezers, bottle carrier, developer, texwipe, fumehood, chemical warning forms
Setup Procedures:
- Look up the development time and developer type on the photoresist data sheet
- Fill out a chemical warning form with the name of the developer being used
- Find a plastic or glass container that will fit your sample
- Using a bottle carrier, bring a bottle of developer to the fumehood you will be working at
- Pour enough developer into the container to cover your sample
Number of Substrates: 1
Process Procedures:
- Set a timer for development
- Place your sample in the container and start the timer
- Slightly agitate the container while developing
- Stop developing once your timer has ended or when you no longer see photoresist coming off the sample
- If you are unsure if your sample is finished developing, check it under a microscope with a UV filter
- Under-developed features will have wide corners and thin spaces or a “rainbow” pattern where the resist is still in the feature
- Over-developed features will have a rounded corners and thin lines
- If you need to develop for more than the time on the data sheet states, add extra time in small increments, continuously checking under the microscope
- Take your sample out of the developer and rinse under gently running DI water
- Place your sample on a texwipe and blow dry with the nitrogen gun. Use a sweeping motion while working from one side of the sample to the opposite side.
- Dispose of base developer in the sink with plenty of running city water. Solvent developers should be disposed of in the solvent waste jug.
- Rinse the development container with DI water.
Comments:
- Under –exposed is better than over-exposed
- Be sure to note any differences in development times for later use
Verification: