IMS- Micro/Nano Fabrication Facility
4.2.1 Preparing Photoresist

Purpose: To prepare photoresist for spin coating

Location: Pettit or Marcus Cleanrooms

Chemicals: acetone, methanol, isopropanol, photoresist

Supplies Needed: glass or Pyrex container, texwipe, tweezers, nitrogen gun, fumehood, photoresist labels, chemical warning form, bottle carrier

Process Procedures:

  1. Get an amber bottle from the staff office, if needed.
  2. Take a stock bottle or your amber bottle out of the refrigerator, and allow it to warm up to room temperature (approximately 1 hour) by bringing it in a bottle carrier to a photoresist cabinet.
  3. If you have a new amber bottle, clean it with an AMI rinse (see cleaning section) and print off chemical labels for it.
  4. If you already have an amber bottle or your own stock bottle, they should be stored in one of the following locations:
    • Labeled photoresist cabinets.
    • Refrigerators in the chemical chase.

Time:  approximately 5 minutes + time to warm up to room temperature

Comments:

  • Photoresist must be at room temperature before use because it is very sensitive to temperature shock.
Contact Information
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332

For process support please click below