E-beam Lithography - The Georgia Tech cleanroom contain a high resolution Electron Beam Lithography (EBL) systems. Click here to learn about the Elionix ultra-high resolution , ZEP, PMMA, nanolithography, structures.

E-beam Lithography

Elionix

G Series

ELS-G100

The Georgia Tech Elionix ELS-G100 is a high speed, ultra high precision thermal field emission (TFE) electron beam lithography system developed to meet the market needs for next-generation nanometric applicatioread more

Model:

ELS-G100

Nano Specs:

Generates patterns with a line width of 7nm
Stable 1.8nm electron beam using high beam current at 100kV
A 20bit DAC provides high beam positioning resolution
At a beam current of 1nA, 20nm lines can be written over an entire 500μm field without stitching
8 inch stage

Contact Information

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