IMS- Micro/Nano Fabrication Facility
PVD75 Filament Evaporator
Equipment Description

A close up of a machineDescription automatically generated

The filament evaporator is used to coat samples with various metals. The filament evaporator is ordinarily used for gold, nickel, chromium, aluminum, and copper coatings.  In a typical process the chamber is pumped down to a pressure of 5 x 10-7 torr to prevent air molecules from interrupting metal atoms as they travel from the evaporation source to the substrate. Then the metal evaporation source is heated to a high temperature by a tungsten filament. This causes the metal to evaporate and be deposited on the substrate. Typical deposition rates range from 2 to 5 A/second. The filament evaporator is a good choice for samples that need to be evaporator coated (to avoid coating the sides of rough topologies) but are sensitive to x-ray radiation from the E-beam.

Capable of evaporating: Titanium (Ti), Chrome (Cr), Gold (Au), Nickel (Ni), Aluminum (Al), Copper (Cu), Iron (Fe), Silver (Ag), Tungsten (W), Palladium (Pd), Germanium (Ge), Vanadium (V), Nichrome (NiCr), Niobium (Nb), Bismuth (Bi), Other metals*

Manufacturer: Kurt J Lesker

Model Number: PVD 75

Room Number: 1279

 

 

 

 

 

 

Institute Georgia Tech
Department IEN - Micro/Nano Fabrication Facility
Sub Tool Of
Marcus Inorganic Cleanroon
Machine Specifications and Data

Machine Specifications:

  • Turbo pump
  • Low voltage 
  • High current resistance heating


Metallization Calibration Data: (Updated Jan 2020)

  Z-Ratio Tooling Factor
Au 0.381 167
Cu 0.437 100
Al 0.900 347
Cr 0.305 200

 

Information
Schedule
Training
Equipment Description

The Georgia Tech filament evaporator is used to coat samples with various metals. The PVD is a good choice for samples that need to be evaporator coated (to avoid coating the sides of rough topologies) but are sensitive to x-ray radiation from the E-beam. -Integrated touch screen control -Single substrate up to 12" diameter -Multiple substrate up to 4" diameter -Substrate fixture rotation up to 20 rpm

Function

  • Filament Evaporation System

Materials Deposited

  • Al, Cu, Cr, Au

Component Specifications

  • 12” diameter sample holder.
  • Three nodes for three different sources

Substrate Size

  • Up to 12” wafer

Process Pressure

  • 5x10-6Torr to 5x10-7Torr

Vendor Specified Capabilities

  • Crystal monitor deposition controller
Institute Georgia Tech
Department IMS- Micro/Nano Fabrication Facility
Sub Tool Of
Marcus Inorganic Cleanroom
Contact Information