PVD75 Filament Evaporator
Equipment Description
The filament evaporator is used to coat samples with various metals. The filament evaporator is ordinarily used for gold, nickel, chromium, aluminum, and copper coatings. In a typical process the chamber is pumped down to a pressure of 5 x 10-7 torr to prevent air molecules from interrupting metal atoms as they travel from the evaporation source to the substrate. Then the metal evaporation source is heated to a high temperature by a tungsten filament. This causes the metal to evaporate and be deposited on the substrate. Typical deposition rates range from 2 to 5 A/second. The filament evaporator is a good choice for samples that need to be evaporator coated (to avoid coating the sides of rough topologies) but are sensitive to x-ray radiation from the E-beam.
Capable of evaporating: Titanium (Ti), Chrome (Cr), Gold (Au), Nickel (Ni), Aluminum (Al), Copper (Cu), Iron (Fe), Silver (Ag), Tungsten (W), Palladium (Pd), Germanium (Ge), Vanadium (V), Nichrome (NiCr), Niobium (Nb), Bismuth (Bi), Other metals*
Manufacturer: Kurt J Lesker
Model Number: PVD 75
Room Number: 1279
Institute |
Georgia Tech |
Department |
IEN - Micro/Nano Fabrication Facility |
Sub Tool Of
|
Marcus Inorganic Cleanroon |
Machine Specifications and Data
Machine Specifications:
- Turbo pump
- Low voltage
- High current resistance heating
Metallization Calibration Data: (Updated Jan 2020)
|
Z-Ratio |
Tooling Factor |
Au |
0.381 |
167 |
Cu |
0.437 |
100 |
Al |
0.900 |
347 |
Cr |
0.305 |
200 |
Information
Schedule
Training
The Georgia Tech filament evaporator is used to coat samples with various metals. The PVD is a good choice for samples that need to be evaporator coated (to avoid coating the sides of rough topologies) but are sensitive to x-ray radiation from the E-beam. -Integrated touch screen control -Single substrate up to 12" diameter -Multiple substrate up to 4" diameter -Substrate fixture rotation up to 20 rpm
Function
- Filament Evaporation System
Materials Deposited
Component Specifications
- 12” diameter sample holder.
- Three nodes for three different sources
Substrate Size
Process Pressure
Vendor Specified Capabilities
- Crystal monitor deposition controller
Institute |
Georgia Tech |
Department |
IMS- Micro/Nano Fabrication Facility |
Sub Tool Of |
Marcus Inorganic Cleanroom |
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