IEN - Micro/Nano Fabrication Facility
6.1 Photoresists

Photoresists are light-sensitive polymeric resins formulated for use in a patterning process where they serve as masking materials for transferal of images into an underlying substrate. The GT IEN cleanroom provides several different positive and negative photoresists suitable for a variety of applications. The chart below provides an overview of some of the photoresists used in the cleanroom. More information about the individual resist, including the data sheet and SDS, can be found at the individual links.




Contact Information
The Institute for Electronics and Nanotechnology at Georgia Tech
345 Ferst Drive, Atlanta GA, 30332

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